POSITIONING METHOD, OVERLAY OPTIMIZATION METHOD, DEVICE MANUFACTURING METHOD, AND LITHOGRAPHIC PROJECTION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method for optimizing positioning conditions of a lithographic projection apparatus. SOLUTION: This method includes a step of projecting a radiation beam on a target portion 10 of a substrate and a step of measuring multiple diffracted signals emitted from the target portion. The method further includes a step of calculating a variance in each of the multiple diffracted signals so as to determine multiple variances of the diffracted signals and a step of adjusting positioning conditions of a lithographic projection apparatus on the basis of the analysis of a plurality of the variances. COPYRIGHT: (C)2005,JPO&NCIPI