发明名称 PROJECTION OPTICAL SYSTEM AND EXPOSURE DEVICE PROVIDED WITH THE PROJECTION OPTICAL SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a reflection type projection optical system having excellent reflection property even to an X-ray and capable of excellently correcting aberration while restraining the upsizing of a reflection mirror. SOLUTION: The projection optical system is provided with eight reflection mirrors and forms a reduced image on a 1st surface (4) on a 2nd surface (7). It is provided with a 1st reflection image forming optical system (G1) for forming an intermediate image on the 1st surface and a 2nd reflection image forming optical system (G2) for forming the image of the intermediate image on the 2nd surface. The 1st reflection image forming optical system has the 1st reflection mirror (M1), the 2nd reflection mirror (M2) provided with an aperture diaphragm (AS), the 3rd reflection mirror (M3) and the 4th reflection mirror (M4) in the incident order of light from the 1st surface side. The 2nd reflection image forming optical system has the 5th reflection mirror (M5), the 6th reflection mirror (M6), the 7th reflection mirror (M7) and the 8th reflection mirror (M8) in the incident order of the light from the 1st surface side. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005189247(A) 申请公布日期 2005.07.14
申请号 JP20030426617 申请日期 2003.12.24
申请人 NIKON CORP 发明人 TAKAHASHI TOMOWAKI
分类号 G02B17/00;G02B13/24;G02B17/06;G03F7/20;H01L21/027;(IPC1-7):G02B17/00 主分类号 G02B17/00
代理机构 代理人
主权项
地址