| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a chromium nitride film having high peel resistance and abrasion resistance, at a low temperature. SOLUTION: In the method for forming the chromium nitride film on a substrate with a physical vapor deposition method, this method comprises forming a peel-resistant lower layer 2 of chromium nitride on the substrate 1, which has tensile residual stress or compressive residual stress of a predetermined value or lower; and subsequently forming an abrasion-resistant upper layer 3 of chromium nitride on the lower layer 2, which has a higher compressive residual stress than the lower layer has. COPYRIGHT: (C)2005,JPO&NCIPI
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