发明名称 VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, ORGANIC ELECTROLUMINESCENCE DEVICE AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which prevents a fracture of a substrate occurring when removing a permanent magnet for attracting a mask from the substrate, in the vapor deposition apparatus which arranges the permanent magnet for attracting the mask, on an opposite side of the substrate to a surface to be vapor-deposited, in order to strengthen a contacting force between the substrate and the mask; a vapor deposition method; an organic electroluminescence device; and electronic equipment. SOLUTION: The vapor deposition apparatus 1 comprises a mask 23 made of a magnetic material placed on the side of a surface to be vapor-deposited of the substrate 21 in a vacuum chamber 11, and the permanent magnet 18 placed on the back side of the substrate 21, to form a film on the surface to be vapor-deposited of the substrate 21 by using a vapor deposition source in the state of making the mask 23 adsorbed toward the substrate 21, wherein a spacer 19 is placed between the permanent magnet 18 and the substrate 21. The spacer 19 is composed so as to be capable of mounting a magnetic field shield 22, and mounts the magnetic field shield 22 thereon when releasing the adsorbed state of the mask 23 to the substrate 21. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005187875(A) 申请公布日期 2005.07.14
申请号 JP20030429994 申请日期 2003.12.25
申请人 SEIKO EPSON CORP 发明人 TOMIOKA SHUNJI
分类号 H05B33/10;C23C14/04;C23C14/24;C23C14/50;H01L51/50;H05B33/14;(IPC1-7):C23C14/04 主分类号 H05B33/10
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