发明名称 Method and apparatus for generating gas to a processing chamber
摘要 A method and apparatus for generating gas for a processing system is provided. In one embodiment, an apparatus for generating gas for a processing system includes an unitary, isolatable, transportable canister having a plurality of first spacing elements, a plurality of second spacing elements and a solid material disposed within the canister. The spacing elements have different mean diameters. The solid material is adapted to produce a gas vapor when exposed to a temperature above a predetermined level at a predetermined pressure. In another embodiment, an apparatus for generating gas includes a gas source coupled to a processing chamber by a first gas line. A canister is coupled in-line with the first gas line and contains a solid material that produces a process gas when heated. A heater is disposed between the gas source and the canister to heat gas flowing into the canister.
申请公布号 US6915592(B2) 申请公布日期 2005.07.12
申请号 US20020208305 申请日期 2002.07.29
申请人 APPLIED MATERIALS, INC. 发明人 GUENTHER ROLF A.
分类号 B01D7/00;C23C16/448;(IPC1-7):F26B25/00;C23C16/00 主分类号 B01D7/00
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