| 摘要 |
PROBLEM TO BE SOLVED: To provide a nano hole boring device not causing a problem of corrosion, etc., inexpensive, shortening nano hole forming time and facilitating control of a hole diameter and depth of a nano hole, and a nano hole boring method. SOLUTION: A vacuum chamber 1 has a plasma generating space 11 inside. A magnetic field generating means 4 applies a varying magnetic field in the plasma generating space 11 and gives fluctuation to a plasma. A substrate 6 is arranged in the plasma generating space 11, and the nano hole is bored on the substrate 6 by using a potential difference generated between a first electric conductor 61 and a second electric conductor 62 caused by the fluctuation of the plasma. COPYRIGHT: (C)2005,JPO&NCIPI
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