发明名称 COMPOSITION FOR USE IN MEMBRANE FORMATION, FORMING METHOD FOR MEMBRANE, AND SILICA-BASED MEMBRANE
摘要 PROBLEM TO BE SOLVED: To obtain a membrane-forming composition which is capable of forming a membrane having a low dielectric constant and an excellent surface eveness and which is suitable for a material of a layer-insulation membrane. SOLUTION: The membrane-forming composition contains (A) a hydrolytic condensate, obtained by hydrolyzing and condensing silane compounds containing a compound expressed by the formula (1): (R<SP>1</SP>OCH<SB>2</SB>)<SB>a</SB>Si(OR<SP>2</SP>)<SB>4-a</SB>[wherein, R<SP>1</SP>and R<SP>2</SP>are each a univalent organic group; and (a) is 1 or 2], and (B) an organic solvent. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005179587(A) 申请公布日期 2005.07.07
申请号 JP20030425234 申请日期 2003.12.22
申请人 JSR CORP 发明人 HASEGAWA KOICHI
分类号 C09D183/04;C09D5/00;C09D183/02;C09D183/08;(IPC1-7):C09D183/04 主分类号 C09D183/04
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