发明名称 CONDUCTIVE FILM FORMATION METHOD AND FORMATION APPARATUS, WIRING BOARD, ELECTROOPTICAL APPARATUS, AND ELECTRONIC APPLIANCE
摘要 PROBLEM TO BE SOLVED: To provide a method of forming a conductive film by lowering the impedance of a conductive film so as to make the film suitable for use for a wiring pattern in simple process. SOLUTION: The conductive film formation method is a method for forming a wiring pattern 48 and comprises a step (a) of arranging a liquid 42 containing conductive fine particles on a substrate W; a step (c) of forming a sintered body (a fine particle bonded body ) 45 of the conductive fine particles by heat treatment of the liquid; and a step (d) of pressurizing the sintered body 45 by a pressurizing roll 40. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005177710(A) 申请公布日期 2005.07.07
申请号 JP20030425991 申请日期 2003.12.24
申请人 SEIKO EPSON CORP 发明人 GOHARA MASAYOSHI
分类号 G02F1/1345;B05C5/00;B05C9/12;B05C9/14;B05D5/12;B05D7/00;H01J9/02;H01J11/22;H01J11/34;H05K3/10;H05K3/28;(IPC1-7):B05D5/12;H01J11/02 主分类号 G02F1/1345
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