| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask for vapor deposition in which, even when it is influenced by heat, and its intra-plane temperature distribution is made uneven, the adverse influence by the unevenness of the temperature distribution can be eliminated as possible, and which can correspond to patterning with high precision. SOLUTION: In the mask for vapor deposition provided with a thin sheet-shaped mask body 2 having an opening with a shape corresponding to a formation pattern to the object to be treated and a frame body supporting the region in the vicinity of the outer circumferential edge thereof, and in which the mask body 2 is stuck to the frame body, the stuck part of the mask body 2 and the frame body is formed of a line-shaped portion 6 having a curved part. COPYRIGHT: (C)2005,JPO&NCIPI
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