| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a mask for vapor deposition with good operability capable of obtaining high processing precision even when manufacturing a mask of delta configuration by applying photo-etching to a metal thin plate with a thickness of conventional metal plate. SOLUTION: A plurality of small concave holes are arranged in staggered configuration by etching the metal thin plate from one side thereof, and a plurality of large concave holes larger than the small concave hole, of which, the shape in plane view is almost similar to that of the small concave hole are arranged in staggered configuration by etching the metal thin plate from the other side thereof, so as to correspond to the position where the small concave holes are formed. At this time, the metal thin plate is etched as far as the periphery of the large concave holes adjacent in staggered configuration overlap each other. A plurality of translucent holes are formed by making the small concave hole and the large concave holes communicate with each other in a thickness direction of the metal thin plate. COPYRIGHT: (C)2005,JPO&NCIPI
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