发明名称 METHOD FOR MANUFACTURING FINE PROJECTION ARRAY, FINE PROJECTION ARRAY, FINE RECESSED SURFACE ARRAY, AND METHOD FOR MANUFACTURING FINE RECESSED SURFACE ARRAY
摘要 PROBLEM TO BE SOLVED: To provide a master and mold for inexpensively manufacturing a large-area or long-sized microlens array and a method for manufacturing the same. SOLUTION: The method for manufacturing the fine projection arrays comprising a step of preparing a substrate having electric conductivity on its surface, a step of forming an insulating layer on the surface of the substrate, a step of forming a plurality of openings on the substrate, a step of forming a first plating layer by a first plating solution having an isotropic growth property on the substrate formed with the openings, and a step of forming a second plating layer on the first plating layer by a second plating solution having a smoothing effect on the substrate formed with the first plating layer, wherein the insulating layer is a photoresist and in the step of forming the openings among the aforesaid processes, the desired regions are exposed with one point or a plurality of points being irradiated with a light source, scanning the same on the substrate and moving the substrate, then subjecting the photoresist to development processing is employed as the main configuration. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005181699(A) 申请公布日期 2005.07.07
申请号 JP20030422671 申请日期 2003.12.19
申请人 RICOH CO LTD 发明人 TEZUKA SHINJI
分类号 G02B3/00;B29C33/38;B29L11/00;C25D5/02;C25D5/12;C25D7/00;(IPC1-7):G02B3/00 主分类号 G02B3/00
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