Verfahren zum Herstellen einer Phasenschiebemaske

摘要

The phase shift mask and a method for fabricating the phase shift mask of the present invention improve a light intensity in a densely packed pattern. The phase shift mask has a light shielding layer with a plurality of light transmissive regions formed therein, including an etch stopper layer with first light transmissive patterns and second light transmissive patterns formed alternately thereon. Each of the first light transmissive patterns has one of the light transmissive regions and a first phase shift layer formed between the rims of one of the light transmissive regions, and each of the second light transmissive patterns has a second phase shift layer formed on a central part of another one of the light transmissive regions.