发明名称 ELECTRON GUN AND ELECTRON BEAM PROJECTION AND EXPOSURE DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an electron gun which can emit thermoelectrons at comparatively low temperatures and in which power saving and uniformity of illuminance can be obtained, and an electron beam projection and exposure device equipped with such electron gun. <P>SOLUTION: The electron gun 1 comprises an electron source member (chip) 3 and a holder 7 which surrounds the portion other than the electron emission face 3a of the chip 3. The chip 3 is made of LaB<SB>6</SB>and the holder 7 is produced by a material having a high melting point and a high work function. The chip 3 is fitted in the holder 7 through pieces 5, 5a made of carbon. Since the LaB<SB>6</SB>has a property of emitting the thermoelectron at low temperatures (about 1,200°C ), the temperature of the electron emission face 3a of the chip 3 is easily made uniform and the thermoelectrons can be emitted at a uniform electron density. Then, the thermoelectrons emitted from the holder 7 can be suppressed to a small level. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005183335(A) 申请公布日期 2005.07.07
申请号 JP20030426237 申请日期 2003.12.24
申请人 NIKON CORP 发明人 YAHIRO TAKEHISA
分类号 G03F7/20;H01J1/20;H01J1/26;H01J37/06;H01J37/305;H01L21/027;(IPC1-7):H01J37/06 主分类号 G03F7/20
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