ALIGNER AND METHOD OF FORMING PATTERN USING THE SAME

摘要

PROBLEM TO BE SOLVED: To realize making of the good shape of a resist pattern obtained by a liquid immersion lithography. SOLUTION: An aligner includes a solution reservoir 40 for supplying a liquid immersion solution 21A on a resist film formed on a substrate 20, and an illumination optical system 30 for irradiates an exposure light to the resist film through a mask 23 in the state that the liquid immersion solution 21A is arranged on the resist film. The solution reservoir part 40 is connected to the liquid immersion solution tank 41 for circulating the liquid immersion solution 21A during the exposure. COPYRIGHT: (C)2005,JPO&NCIPI