发明名称 |
Apparatus and method for control, pumping and abatement for vacuum process chambers |
摘要 |
The present invention is an apparatus and method for controlling pressure, pumping a vacuum and providing abatement for a plurality of vacuum processing chambers. The system may be used in semiconductor manufacture. Multiple vacuum processing chambers are exhausted by turbo pumps into a common abatement chamber, which is maintained at sub-atmospheric pressure by a backing pump. Pressure in the processing chambers is independently controlled. The internal volume of the abatement device provides a buffer that reduces the effect of pressure changes in one processing chamber affecting pressure in the other chambers.
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申请公布号 |
US2005147509(A1) |
申请公布日期 |
2005.07.07 |
申请号 |
US20030750309 |
申请日期 |
2003.12.31 |
申请人 |
BAILEY CHRISTOPHER M.;BOGER MICHAEL S. |
发明人 |
BAILEY CHRISTOPHER M.;BOGER MICHAEL S. |
分类号 |
F04B37/16;F04D19/04;F04D25/00;F04D25/16;H01L21/02;(IPC1-7):F04B23/08;F04B3/00 |
主分类号 |
F04B37/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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