| 摘要 |
<p>The present invention relates to an apparatus and method for carrying out a PCVD deposition process, wherein one or more doped or undoped layers are coated onto the interior of a glass substrate tube, which apparatus comprises an applicator having an inner and an outer wall and a microwave guide which opens into the applicator, which applicator extends around a cylindrical axis and which is provided with a passage adjacent to the inner wall, through which the microwaves can exit, over which cylindrical axis the substrate tube can be positioned, and wherein at least one choke of annular shape having a length 1 and a width b is centred around the cylindrical axis within the applicator. In addition, separate independent claims for an apparatus and method are provided as above only without the choke, instead a metal shell is used to prevent leakage of high frequency energy. <IMAGE></p> |
