发明名称 SINTERED COMPACT TARGET FOR FORMING OPTICAL RECORDING MEDIUM PROTECTIVE FILM, AND ITS PRODUCTION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a sintered compact target for forming an optical recording medium protective film in which deflective strength is high even if being enlarged, and further, sputtering cracks are less liable to be generated even if high output sputtering is performed, and with which film formation stability can be improved, and to provide its production method. <P>SOLUTION: The sintered compact target for forming the optical recording medium protective film is obtained by the improvement of a sintered compact target having a composition comprising 10 to 30 mol% SiO<SB>2</SB>powder, and the balance ZnS, and in which the SiO<SB>2</SB>powder is dispersed into the ZnS matrix. The target has a characteristic constitution where the SiO<SB>2</SB>powder is composed of amorphous first SiO<SB>2</SB>particles having a mean particle diameter of 1.0 to 10 &mu;m and amorphous second SiO<SB>2</SB>particles having a mean particle diameter of 0.0005 to 0.1 &mu;m. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005171315(A) 申请公布日期 2005.06.30
申请号 JP20030413008 申请日期 2003.12.11
申请人 MITSUBISHI MATERIALS CORP 发明人 CHO SHUHIN;WATARAI YUSUKE;SHIRAI TAKANORI;MISHIMA TERUSHI
分类号 C04B35/547;C23C14/34;G11B7/24;G11B7/254;G11B7/257;G11B7/26 主分类号 C04B35/547
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