发明名称 |
Method and structure for fabricating a halftone mask for the manufacture of semiconductor wafers |
摘要 |
A method for manufacturing a mask for integrated circuit devices. The method includes providing a quartz substrate having a surface and forming a MoSi film overlying the surface of the quartz substrate. The method also includes patterning the MoSi film overlying the quartz substrate to form a mask pattern. A step of forming an opaque edge structure comprising a carbon bearing material on a portion of the surface around a peripheral region of the mask pattern is also included.
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申请公布号 |
US2005142892(A1) |
申请公布日期 |
2005.06.30 |
申请号 |
US20040773519 |
申请日期 |
2004.02.06 |
申请人 |
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION |
发明人 |
LU CONG |
分类号 |
G03F1/00;G03F1/08;H01L21/027;H01L21/31;H01L21/82;(IPC1-7):H01L21/31 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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