| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photo acid generator compound exhibiting high spectral sensitivity to near ultraviolet light, to provide a method for producing the compound, to provide a photosensitive resin composition using the compound, and to provide a photosensitive material. <P>SOLUTION: This onium sulfonate compounds represented by general formula (1) and general formula (4). The method for producing the compound. Further, a photosensitive resin composition using the same, and a photosensitive material using the photosensitive resin composition using the same. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
