发明名称 Method of detecting and preventing regions critical for etching, e.g. for screen printing plate manufacture - involves accessing data structures of layout and configuration elements in plane of layout, detecting critical regions between configuration elements, altering, displaying regions
摘要 <p>The method involves accessing data structures of a layout, accessing data structures of configuration elements (A-C) in a plane of the layout, detecting critical regions (X,Y,Z,K1,K2) between the configuration elements according to programme procedures, altering the regions and displaying them. Alterations are performed to prevent under etching and the altered regions are integrated into the existing data structure for the layout.</p>
申请公布号 DE29924723(U1) 申请公布日期 2005.06.30
申请号 DE1999224723U 申请日期 1999.09.29
申请人 SIEMENS AG 发明人
分类号 H01L21/48;H01L23/498;H01L23/528;H05K3/00;H05K3/06;H05K3/22;(IPC1-7):H05K3/00 主分类号 H01L21/48
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