发明名称 |
Plasma device for producing linearly expanded, inductively coupled plasma uses a vacuum chamber to treat or coat substrates with plasma |
摘要 |
<p>Designed as stick electrodes, first (11) and second (12) electrodes are coupled electrically to a frequency generator and arranged parallel to an expansion in substrates being treated or coated. The stick electrodes are mounted at first (7) and second (8) contact points that are coupled to the frequency generator.</p> |
申请公布号 |
DE202004020458(U1) |
申请公布日期 |
2005.06.30 |
申请号 |
DE20042020458U |
申请日期 |
2004.02.05 |
申请人 |
VTD VAKUUMTECHNIK DRESDEN GMBH |
发明人 |
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分类号 |
H01J37/32;H05H1/24;(IPC1-7):H05H1/24 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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