STAGE APPARATUS, EXPOSURE APPARATUS, AND EXPOSURE METHOD

摘要

A stage apparatus (PST) has a holder (PH) for holding the back surface (PC) of a substrate (P) and a stage (52) moving while supporting the holder (PH). The holder (PH) has holding sections (33, 34) for holding, on the inner side of the outer periphery of the substrate (P), the back surface (PC) of the substrate (P). Further, the stage apparatus (PST) has a liquid repelling member (30) with liquid repelling ability, the liquid repelling member (30) provided separately from the holder (PH) at least at a position opposite the back surface (PC) of the substrate (P). As a result, liquid is prevented from entering between the substrate and the holder even when exposure processing is performed with the liquid placed between a projection optical system and the substrate.