发明名称 MAGNETIC MEMORY CELL, ITS FORMING METHOD, MAGNETIC MEMORY ARRAY, AND ITS MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of forming magnetic memory cells, in which magnetic influence from the ambience is reduced, and magnetic information can be read stably. <P>SOLUTION: The method includes a stage of forming a MTJ element 20A comprising a magnetization free layer 25 covered with a cap layer 30 and a protective layer 50 on an electrode layer 10, a stage of forming a first insulating layer 41 so as to cover the whole, a stage of performing flattening treatment over the entire surface so that one portion (residual portion 52) in a thickness direction of the protective layer 50 is left, a stage of removing the residual portion 52 entirely so that the upper surface of the cap layer 30 may be exposed, a step of forming a bit line 60 so that the upper surface 30S of the cap layer 30 may be covered, and a step of filling the periphery of the bit line 60, and forming a second insulating layer 42 so that a flat surface F1 contiguous to the upper surface of the bit line 60 may be constituted. Therefore, the distance of the thickness direction of the magnetization free layer 25 and a first current line 60 can be uniform and precise over the whole based on the thickness of the cap layer 30. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005175493(A) 申请公布日期 2005.06.30
申请号 JP20040357286 申请日期 2004.12.09
申请人 HEADWAY TECHNOLOGIES INC 发明人 HAN CHERNG-CHYI;HONG LIUBO
分类号 H01F10/32;G11C11/14;H01L21/8246;H01L27/105;H01L27/22;H01L29/82;H01L31/062;H01L43/08;H01L43/12;(IPC1-7):H01L27/105 主分类号 H01F10/32
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