发明名称 Semiconductor device
摘要 A semiconductor device has an anode impurity region and a cathode impurity region on a semiconductor substrate with a SOI (Silicon-On-Insulator) structure. An impurity region for voltage control is formed between the anode impurity region and the cathode impurity region.
申请公布号 US2005139917(A1) 申请公布日期 2005.06.30
申请号 US20040848170 申请日期 2004.05.19
申请人 IGARASHI YASUSHI 发明人 IGARASHI YASUSHI
分类号 H01L29/88;H01L29/739;H01L29/866;(IPC1-7):H01L27/12 主分类号 H01L29/88
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