| 摘要 |
PROBLEM TO BE SOLVED: To provide an electronic beam lithography device which minimizes contamination of constituent elements such as an electronic beam column while the pressure inside a device changes. SOLUTION: A balancing bypass valve is provided to a common wall between a first chamber and a second chamber. Consequently, (i) when the pressure inside the first chamber exceeds the pressure inside the second chamber, the device operates in a first mode, and gas flows from the first chamber to the second chamber; (ii) when the pressure inside the second chamber exceeds the pressure inside the first chamber, the device operates in a second mode and gas flows from the second chamber to the first chamber; and (iii) when the pressure is equal both in the first and second chambers, the device operates in a third mode, and the first chamber is sealed from the second chamber. COPYRIGHT: (C)2005,JPO&NCIPI
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