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发明名称
PHOTORESIST POLYMER AND PHOTORESIST COMPOSITION CONTAINING IT
摘要
申请公布号
KR20050063233(A)
申请公布日期
2005.06.28
申请号
KR20030094610
申请日期
2003.12.22
申请人
HYNIX SEMICONDUCTOR INC.
发明人
LEE, GEUN SU
分类号
G03F7/004;(IPC1-7):G03F7/004
主分类号
G03F7/004
代理机构
代理人
主权项
地址
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