发明名称 POSITIVE RADIATION-SENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive composition having both high sensitivity and high resolution. <P>SOLUTION: The positive radiation-sensitive composition contains (a) a polymer which is made alkali-soluble by the action of an acid, (b) an acid generator which generates an acid upon irradiation with a radiation and (c) a compound represented by formula (1) wherein n represents 0-4; a represents 1 to n+2; R<SP>1</SP>represents a 1-6C alkyl, a 6-15C aryl, a 7-16C aralkyl or halogen; and b represents 0 to 2n+3 with the proviso that a+b equals 1 to 2n+4, and when b is &ge;2, a plurality of symbols R<SP>1</SP>can be the same or different. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005164791(A) 申请公布日期 2005.06.23
申请号 JP20030401151 申请日期 2003.12.01
申请人 TORAY IND INC 发明人 SENOO MASAHIDE;TAMURA KAZUTAKA;FUJII MASAMITSU
分类号 G03F7/004;G03F7/039;H01L21/027 主分类号 G03F7/004
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