发明名称 DEPOSITION FILM FORMING SYSTEM AND DEPOSITION FILM FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a deposition film forming system and deposition film forming method providing excellent deposition film characteristics and productivity in the formation of the deposition films on a plurality of cylindrical substrates by installing the plurality of cylindrical substrates in a decompressible reaction vessel, and decomposing the gaseous raw materials supplied into the reaction vessel by the high-frequency electric power introduced from high-frequency electric power introducing means and more particularly to provide a deposition film forming system and deposition film forming method capable of reducing the occurrence of image defects in the deposition film formation of an electrophotographic photoreceptor. SOLUTION: The deposition film forming system has the decompressible reaction vessel at least partly comprised of a dielectric member, the plurality of cylindrical substrates arranged in the reaction vessel, a gaseous raw material introducing means, and a plurality of high-frequency electrodes arranged on the outside of the reaction vessel, and forms the deposition films on the plurality of cylindrical substrates by applying the high-frequency electric power to the high-frequency electrodes to generate a glow discharge in the reaction vessel and decomposing the gaseous raw materials introduced into the reaction vessel, wherein plate-like members for partitioning at least portions of the spaces existing between the adjacent cylindrical substrates are disposed. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005163165(A) 申请公布日期 2005.06.23
申请号 JP20030407947 申请日期 2003.12.05
申请人 CANON INC 发明人 OTSUKA TAKASHI;SEKI YOSHIO;KARAKI TETSUYA;HASHIZUME JUNICHIRO;OKAMURA TATSUJI;TSUCHIDA NOBUFUMI
分类号 G03G5/08;C23C16/44;(IPC1-7):C23C16/44 主分类号 G03G5/08
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