Method for determining a map, device manufacturing method, and lithographic apparatus

摘要

A method according to one embodiment of the invention includes determining a map of a first part of a substrate belonging to a group of substrates. The method includes measuring a second part of at least one substrate belonging to the group, the second part being at least partially overlapping with the first part; computing a map (e.g. an average profile map or average height map) of the first part of the substrate belonging to the group, based on the second part; and storing the computed map, e.g. for use during a later determination of a height or tilt of a substrate from the group.