发明名称 COMPOSITION FOR COPPER OXIDE ELECTROLYTIC FORMATION, AND METHOD OF FORMING COPPER OXIDE FILM AND COPPER OXIDE FILM USING THE SAME
摘要 PROBLEM TO BE SOLVED: To form a copper oxide film with uniform film thickness and composition to a complicated deformed shape with a wet process by a method having satisfactory productivity in a composition for copper oxide electrolytic formation and a method of forming a copper oxide film. SOLUTION: The composition for copper oxide electrolytic formation is composed of an aqueous solution at least comprising an organic acid at least having a carboxyl group and a hydroxyl group, and copper ions. Thus, in a region where the production of precipitates such as copper hydroxide is predicted in an aqueous solution comprising no organic acid, a dissolution region where the precipitations are not produced is present, and copper oxide can be formed by a wet process. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005163091(A) 申请公布日期 2005.06.23
申请号 JP20030402311 申请日期 2003.12.01
申请人 OSAKA CITY;MATSUSHITA ELECTRIC IND CO LTD 发明人 ISAKI MASANOBU;MATSUTANI SHINYA
分类号 C25D9/08;(IPC1-7):C25D9/08 主分类号 C25D9/08
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