发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device in which the dispersion of copper into an insulating film can be surely prevented in the case of forming a through via by a wiring material containing copper. SOLUTION: As the constitution of the semiconductor device in which a semiconductor chip 1 is packaged in a package substrate 2 and a via 4 penetrated into the package substrate 2 is formed in the thickness direction of the package substrate 2, the via 4 is formed by the wiring material containing copper, and the insulating film 7 of which the inside and outside are held between a pair of barrier layers 6, 8 is formed around the via 4, so that the dispersion of copper to the insulating film 7 is stopped on both the inside and outside of the insulating film 7. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005166966(A) 申请公布日期 2005.06.23
申请号 JP20030403979 申请日期 2003.12.03
申请人 SONY CORP 发明人 SHIBUKI SHUNICHI
分类号 H01L23/12;(IPC1-7):H01L23/12 主分类号 H01L23/12
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