PROCESS AND APPARATUS TO CONTINUOUSLY FORM A UNIFORM SHEET FOR USE AS A SEMICONDUCTOR POLISHING PAD

摘要

A process and apparatus are disclosed for the continuous manufacture of a polyurethane sheet to be used as polishing pad for chemical-mechanical polishing. The process uses urethane pre-polymers and fillers/additives fed from a tank (10) which is mixed with a curing agent stored in a nitrogen blanked tank (20) inside a dynamic mixer (30). The reacting composition (32) is fed to a feed end of a double steel belt press (40) which is heated and compressed therein. A continuous sheet exits that the belt press (40) and is cut to length by a roller blade cutter (62). Cut sheets (32B) are then stack ed (70) and post cured in an oven (80).