| 摘要 |
PROBLEM TO BE SOLVED: To prevent particles from being mixed in a thin film under film deposition. SOLUTION: Ion beams B generated from an ion beam source 3 are radiated toward a sputter target 2 to generate film deposition particles toward a substrate W. In order to catch particles P floating in a vacuum chamber 1, a deposition preventive plate 4 having parallel plate-shaped projections 4a of eaves shape inclined in the separating direction from the substrate W is provided on an inner wall of the vacuum chamber 1. A part of the particles P flying into the deposition preventive plate 4 are repeatedly reflected and decelerated in the eaves shape, and taken in the eaves shape of the deposition preventive plate 4. COPYRIGHT: (C)2005,JPO&NCIPI
|
