| 摘要 |
PROBLEM TO BE SOLVED: To decrease a problem of a mold fixing with a substrate during imprint. SOLUTION: An improved method for nano imprint, more concretely, of providing a nano scale pattern on the substrate is disclosed. According to this improvement, a mold (100) and a substrate (115) are provided, and before a pattern has been imprinted from the mold (100) to the substrate (115) by pressing the mold (100) and the substrate (115) each other, a plurality of coating layer (120, 125, 130) are formed on the substrate (115). The top layer having pure anti-adhesion function is provided on the above-mentioned substrate. COPYRIGHT: (C)2005,JPO&NCIPI
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