| 摘要 |
Apparatus for the industrial processing of a material (6) by optical radiati on (10), which apparatus comprises a waveguide (1) for delivering the optical radiation (10), and focussing optics (5) for directing the optical radiation (10) from an output end (12) of the waveguide (1) onto the material (6), wherein the waveguide (1) has a guidance profile (19) across its cross secti on defined by its refractive index profile (25) and optical gain profile (17), and wherein the guidance profile (19) and focussing optics (5) are such that optical power distribution (16) at the surface (14) of the material (6) has first and second optical powers, (P1), (P2) which are located at first and second radii (r1). (r2) from the centre of the optical power distribution (1 6) and which are of substantially higher intensity than a third optical power (P3) at a third radius (r3) that is smaller than the first and the second radii (rl), (r2).
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