| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing an organosilane useful as a film-forming raw material in semiconductor production, or useful for organic synthesis. SOLUTION: The method for producing the organosilane represented by general formula (2): SiH<SB>n</SB>R<SB>4-n</SB>(wherein, n is an integer of 1-3; and R is an alkyl group or an aryl group) by reducing an organosilane represented by general formula (1): SiX<SB>n</SB>R<SB>4-n</SB>(wherein, X is a halogen or an alkoxide; n is an integer of 1-3; and R is an alkyl group or an aryl group) uses an aromatic hydrocarbon-based organic solvent as a reaction solvent, and lithium aluminum hydride as a hydrogenation agent. COPYRIGHT: (C)2005,JPO&NCIPI
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