发明名称 PHOTODETECTABLE ABRASIVE PARTICLE AND POLISHING AGENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an abrasive particle which is used for a chemical mechanical polishimg method and contains a resin, the state of a polished surface polished with which is easily observable, and a polishing flaw on the polished surface is easily findable and the end point of polishing process is easily detectable. <P>SOLUTION: The photodetectable abrasive particle containing a resin colored with a fluorescent or phosphorescent substance is used for the chemical mechanical polishing method. As the resin, the use of a resin having an anionic group in which at least a part of the anionic group is neutralized with a base, makes the polishing particle favorable in granulation and dispersion at the time of manufacturing the polishing particle, and by using the resin after coloring it, capsulating a core particle, forming a cross-linking structure with a polyvalent metal ion, and forming a composite particle with a metal alkoxide and the like, the characteristics necessary for polishing particles such as surface hardness can be obtained. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005154683(A) 申请公布日期 2005.06.16
申请号 JP20030399111 申请日期 2003.11.28
申请人 DAINIPPON INK & CHEM INC 发明人 TABAYASHI ISAO
分类号 B24B37/00;C09K3/14;H01L21/304;(IPC1-7):C09K3/14 主分类号 B24B37/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利