发明名称 |
GROUP III NITRIDE CRYSTAL, ITS MANUFACTURING METHOD, AND MANUFACTURING DEVICE OF GROUP III NITRIDE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a group III nitride crystal having a large growth speed of a crystal and its manufacturing method and to provide a manufacturing device of the group III nitride crystal. SOLUTION: In the manufacturing method of the group III nitride crystal including a molten liquid forming step in which the molten liquid 1 containing at least a group III element and a catalyst material is formed around a seed crystal 2 and a crystal growth step in which the group III nitride crystal 4 is grown on the seed crystal 2 by supplying a nitrogen-containing material 3 to the molten liquid 1 in a reaction vessel 21, temperature control is performed at the crystal growth step so that the temperature of the molten liquid 1 is lowered from the interface 13 of the nitrogen-containing material and the molten liquid toward the interface 12 of the seed crystal 2 and the molten liquid 1 or the interface 14 of the group III nitride crystal 4 grown on the seed crystal 2 and the molten liquid 1. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005154254(A) |
申请公布日期 |
2005.06.16 |
申请号 |
JP20040195666 |
申请日期 |
2004.07.01 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
HIROTA TATSU;NAKAHATA SEIJI |
分类号 |
C30B29/38;C30B9/00;C30B9/12;C30B17/00;C30B29/40;(IPC1-7):C30B29/38 |
主分类号 |
C30B29/38 |
代理机构 |
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