发明名称 |
JIG FOR HEAT TREATMENT AND SURFACE PROTECTION FILM FORMING METHOD THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a plurality of layers of SiC films on the surface of a jig for heat treatment or a surface protection film forming method for the jig for heat treatment which is capable of comparatively simply reducing the impurity concentration in the SiC film and especially the impurity concentration of the uppermost surface layer of the SiC film. SOLUTION: A plurality of layers of SiC films 12a-12e for protecting the surface of the jig for heat treatment are formed by a method wherein the plurality of layers of SiC films 12a-12e are formed on the substrate 11 of the jig for heat treatment through CVD (chemical vapor deposition) method employing a CVD furnace different for each one layer. COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005159014(A) |
申请公布日期 |
2005.06.16 |
申请号 |
JP20030395607 |
申请日期 |
2003.11.26 |
申请人 |
SHIN ETSU HANDOTAI CO LTD |
发明人 |
KIMURA AKIHIRO;MIZUNO MICHIHIKO |
分类号 |
C23C16/42;H01L21/205;H01L21/22;H01L21/324;H01L21/68;H01L21/683;(IPC1-7):H01L21/22 |
主分类号 |
C23C16/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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