| 摘要 |
<p>Disclosed is a cleaning method for removing a metal oxide film (70) adhered to the surface of a metal base (8) which is composed of at least one material selected from the group consisting of aluminum, aluminum alloys, nickel and nickel alloys. A metal base to the surface of which a metal oxide film such as a hafnium oxide film is adherent is cleaned with a cleaning solution (74). At this time, there is used a cleaning solution containing an ammonium fluoride, a hydrofluoric acid and an ethylene glycol or a cleaning solution composed of an aqueous solution of an ammonium fluoride and an acetic acid. By using such a cleaning solution, the metal oxide film can be removed without causing damage such as corrosion to the metal base.</p> |
