发明名称 METHOD OF PRODUCING SILICON MONOCRYSTAL
摘要 A silicon single crystal rod (24) is pulled from a silicon melt (13) molten by a heater (17), and a change in diameter of the silicon single crystal rod every predetermined time is fed back to a pulling speed of the silicon single crystal rod and a temperature of the heater, thereby controlling a diameter of the silicon single crystal rod. A PID control in which a PID constant is changed on a plurality of stages is applied to a method which controls the pulling speed of the silicon single crystal rod so that the silicon single crystal rod has a target diameter and a method which controls a heater temperature so that the silicon single crystal rod has the target temperature. <??>A set pulling speed for the silicon single crystal rod is set so that V/G becomes constant, and an actual pulling speed is accurately controlled so as to match with the set pulling speed, thereby suppressing a fluctuation in diameter of the single crystal rod. <IMAGE>
申请公布号 EP1541721(A1) 申请公布日期 2005.06.15
申请号 EP20030741226 申请日期 2003.07.07
申请人 SUMITOMO MITSUBISHI SILICON CORPORATION 发明人 WAKABAYASHI, D.;SAITO, M.;SATO, S.;FURUKAWA, J.;KITAMURA, K.
分类号 C30B15/00;C30B15/22;C30B29/06;(IPC1-7):C30B29/06;C30B15/26;H01L21/208 主分类号 C30B15/00
代理机构 代理人
主权项
地址