发明名称 System and method for the online design of a reticle field layout
摘要 Provided are a system and method for creating a reticle field layout (RFL). In one example, the method includes receiving information for a RFL design by a computer system directly from a user via a computer interface. The RFL design is automatically verified using predefined specification and design rules accessible to the computer system. The RFL design may be modified by adding additional features before being finalized.
申请公布号 US2005125763(A1) 申请公布日期 2005.06.09
申请号 US20040880903 申请日期 2004.06.30
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 LIN KO-FENG;CHEN YI-HSU;YEH LEE-CHIH;CHEN CHUN-JEN;CHIN TA-CHIN
分类号 G06F13/10;G06F17/50;(IPC1-7):G06F17/50;G21K5/00;G03F9/00 主分类号 G06F13/10
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