发明名称 |
System and method for the online design of a reticle field layout |
摘要 |
Provided are a system and method for creating a reticle field layout (RFL). In one example, the method includes receiving information for a RFL design by a computer system directly from a user via a computer interface. The RFL design is automatically verified using predefined specification and design rules accessible to the computer system. The RFL design may be modified by adding additional features before being finalized.
|
申请公布号 |
US2005125763(A1) |
申请公布日期 |
2005.06.09 |
申请号 |
US20040880903 |
申请日期 |
2004.06.30 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LIN KO-FENG;CHEN YI-HSU;YEH LEE-CHIH;CHEN CHUN-JEN;CHIN TA-CHIN |
分类号 |
G06F13/10;G06F17/50;(IPC1-7):G06F17/50;G21K5/00;G03F9/00 |
主分类号 |
G06F13/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|