发明名称 |
Microelectronic device having disposable spacer |
摘要 |
A method of manufacturing a microelectronic device comprising forming a patterned feature over a substrate and employing a fluorine-containing plasma source to deposit a conformal polymer layer over the patterned feature and the substrate. The polymer layer is etched to expose the patterned feature and a portion of the substrate, thereby forming polymer spacers on opposing sides of the patterned feature.
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申请公布号 |
US2005121750(A1) |
申请公布日期 |
2005.06.09 |
申请号 |
US20030728995 |
申请日期 |
2003.12.05 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHAN BOR-WEN;WANG YU-I;TAO HAN-JAN |
分类号 |
H01L21/033;H01L21/336;H01L23/58;(IPC1-7):H01L23/58 |
主分类号 |
H01L21/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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