| 发明名称 |
LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING DEVICE |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent damages which may be caused by dielectric breakdown of a high voltage system in a lithographic apparatus. <P>SOLUTION: A high voltage conductor in a dielectric pellicle or ion damage prevention system is coated with a separation layer having a resistance low enough to prevent accumulation of charges on its surface and also high enough to restrict a peak current on dielectric breakdown. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
| 申请公布号 |
JP2005148742(A) |
申请公布日期 |
2005.06.09 |
| 申请号 |
JP20040328307 |
申请日期 |
2004.11.12 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
NEERHOF HENDRIK ANTONY JOHANNES;HEERENS GERT-JAN |
| 分类号 |
G03F1/14;G03F7/20;G21K5/10;H01J37/08;H01L21/027;(IPC1-7):G03F1/14 |
主分类号 |
G03F1/14 |
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