发明名称 MANUFACTURING METHOD OF MICROLENS, MANUFACTURING METHOD OF SOLID STATE IMAGING ELEMENT AND SOLID-STATE IMAGING ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of microlens for forming a heat-resistant microlens. SOLUTION: The method includes a step of forming an inorganic light-transmissive film on a substrate, a step of forming a resist film on a position corresponding to a lens forming position on the inorganic film, a step of etching the part with no resist film formed of the inorganic film, a step of removing the remaining resist film, and a step (F) of the inorganic film where the resist film is removed and which is patterned by etching being irradiated with inactive gaseous ion. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005148166(A) 申请公布日期 2005.06.09
申请号 JP20030381683 申请日期 2003.11.11
申请人 SANYO ELECTRIC CO LTD 发明人 TAKEGAWA KAZUYUKI;MATSUI RYOJI;YAMADA TETSUYA;IMAI TSUTOMU;KAI SEIJI;MIZUTANI TOMOKO
分类号 H01L27/146;G02B3/00;H01L27/14;H01L31/10;H04N5/335;(IPC1-7):G02B3/00 主分类号 H01L27/146
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