发明名称 Projection optical system and an exposure apparatus with the projection optical system
摘要 A projection optical system, which forms a reduced image of a first surface onto a second surface, has excellent optical performance without substantially being affected by birefringence despite the use of optical material having intrinsic birefringence. This is done by suitably arranging certain crystal axes of radiation transmissive members that make up the projection optical system relative to the optical axis of the projection optical system, and by suitably arranging the certain crystal axes of the radiation transmissive members relative to the crystal axes of other radiation transmissive members in the projection optical system.
申请公布号 US2005122499(A1) 申请公布日期 2005.06.09
申请号 US20040982781 申请日期 2004.11.08
申请人 NIKON CORPORATION 发明人 OMURA YASUHIRO;SHIRAISHI NAOMASA;TANAKA ISSEY;OWA SOICHI;OZAWA TOSHIHIKO;NIISAKA SHUNSUKE
分类号 G02B13/24;G02B17/08;G03F7/20;(IPC1-7):G03B27/54 主分类号 G02B13/24
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