Edge transfer lithography

摘要

A method for applying a nanoscale resolution pattern of a molecular link onto a surface of a substrate is disclosed. The method referred to as edge transfer lithography, comprises providing a stamp structure ( 10 ) having a surface ( 11 ) with at least one protruding feature ( 16 ). Each protruding feature ( 16 ) has a stamp surface of a respective predefined shape at a protruding end thereof. Each protruding feature and its stamp surface are bounded by at least one edge ( 19 ), which edge intersects the surface of the stamp structure to form a recess. A solution of the molecular ink and a solvent is applied of the surface of the stamp structure ( 10 ) are such that the solution dewets from the surface of the stamp structure ( 10 ) is then dried to evaporate the solvent.