发明名称 WIRING STRUCTURE AND ITS FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To improve the coverage reliability of an insulating layer provided over a wiring structure, such as a coil or the like. SOLUTION: In a wiring structure, such as a planar coil or the like, interconnect lines 2 formed of conductor are formed on a board 1 with an insulating surface, an insulating layer damming wall structure 3 is provided around the outermost part of the interconnect lines 2 while it is not electrically connected to the interconnect lines 2, and the insulating layer 4 is formed over the interconnect lines 2 and the damming wall structure 3. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005150329(A) 申请公布日期 2005.06.09
申请号 JP20030384612 申请日期 2003.11.14
申请人 CANON INC 发明人 TEJIMA TAKAYUKI;SHIMADA YASUHIRO
分类号 H01F5/00;H01F17/00;H01F27/32;H01F41/04;H05K1/16;H05K3/10;H05K3/28;H05K3/46;(IPC1-7):H01F5/00 主分类号 H01F5/00
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