| 摘要 |
Disclosed is a load-lock system and an exposure apparatus having the same, wherein the load-lock system includes a chamber, an exhaust system for exhausting a gas from the inside of the chamber, a heater, a first valve for opening/closing an opening of the chamber, a supply system for supplying a gas into the chamber through the heater and the first valve, and a second valve for opening/closing an opening of the chamber provided for conveyance of an object, wherein the supply system supplies a the gas before the object is conveyed into the chamber and when the second valve is held opened, and wherein the exhaust system exhausts a gas supplied from the supply system, after the conveyance of the object.
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