SUBSTRATE FOR OPTOELECTRONIC DEVICE AND ITS MANUFACTURING METHOD, OPTOELECTRONIC DEVICE AND ITS MANUFACTURING METHOD, EXPOSURE MASK AND ELECTRONIC APPLIANCE

摘要

PROBLEM TO BE SOLVED: To obtain a reflecting layer having a favorable scattering effect by a simple manufacturing process.

SOLUTION: An exposure mask 7 is used for an exposure process to roughen an objective region 511 to be processed of a film 51. The exposure mask 7 has a first region 71 and a second region 72. The first region 71 functions as a light transmitting region to transmit light incident to the periphery of the objective region 511; and the second region 72 has a plurality of dot regions 721 where a light shielding portion 86 to cut the light incident to the objective region 511 is disposed, and has a semitransmitting portion 86 in a region excluding the dot region 721, with the semitransmitting portion transmitting the light incident to the objective region 511 at a lower transmittance than in the transmitting region. The planar form of the light shielding portion 86 is a surfased shape or a polygon with a circumscribed oval.

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